Semiconductor Packaging Materials
Request a sampleDuPont develops new materials to meet ever changing requirements, from workhorse packages like flip-chip technologies to emerging technologies like fan-out wafer level packaging and through silicon vias (TSVs). DuPont is a technology leader in electroplating materials used for underbump metallization (UBM), copper redistribution layer (RDL), Cu pillars, and solder bumps, along with polymers and dielectrics for RDL, photoresists and TSV fill.
Avez-vous une question? Contactez-nousWith more than 50 years invested in technology development, DuPont Electronics & Imaging understands the needs in the market and has developed a broad portfolio of semiconductor packaging materials for a range of technology areas including the product families in the table below:
Family | Description | Applications | Product names |
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Copper Pillar Plating |
Ultra-Pure Fine-Pitch copper plating chemistry |
Cu pillar, Cu stud, and Cu µpillar processes used in advanced WLP architectures, from flip-chip processes, to 2.5D and 3D integration schemes. Work in perfect harmony with DuPont UBM chemistries. |
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Copper Redistribution Layer |
High-purity copper electroplating chemistries for fine-line RDL and improved via-filling performance |
Ideally Suited for Fan-in and Fan-out Wafer Level Packaging |
Intervia™ 8540 & 9000 |
Solder Bump Plating |
HVM-proven tin-silver plating chemistry |
Lead-free, fine-pitch solder bump applications with industry-leading process versatility |
Solderon™ BP |
Under Bump Metallization |
nickel plating chemistry |
under bump metallization (UBM) |
Nikal BP Chemistry |
Bump Plating Photoresists |
Positive- and negative-tone dry film & liquid photoresists |
Designed to meet the tight pitches and varied topographies of today’s advanced wafer level packaging, MEMS, and 3D photolithography applications |
Liquid: Intervia™ BCPR-i 4500, Shipley BPR™ 100 |
Through Silicon Via Copper |
Leading-edge copper through silicon via (TSV) chemistries |
Memory stacking, CMOS image sensors, MEMS devices, and 2.5D interposer architectures |
Interlink™ 9200 Copper |
Packaging Dielectrics |
BCB-based Cyclotene™ and epoxy-based Intervia™ dielectric |
Insulating distribution wiring from the chip to the package substrate to the circuit board |
Intervia™ Photodielectric & Cyclotene™ Advanced Electronic Resin Serie |